TiAlBN and TiAlCrFeSiBN
multi-component nitride films and TiN films were deposited on
NiTi shape memory alloy with vacuum
cathode arc deposition method.The effect of film composition and their deposition process on the properties and microstructure of NiTi substrate has been researched.The results show that the Ni ion release rate of NiTi substrate in Hank's solution decreases after TiAlBN,TiAlCrFesiBN and TiN films are deposited on it.The NiTi substrates with the multi-component films have minimum Ni ion release rate.There is no obvious change of Ni ion release rate in the substrate with TiAlBN films and there is decrease of Ni ion release rate in the substrate with TiAlCrFeSiBN films as bias voltage increases.There are many small titanium droplets and pores on the surface with TiAlBN and TiAlCrFeSiBN films,with which the droplets cohere very well.There are some big titanium droplets and pores on the surface with TiN films,with which the droplets don't cohere very well.The transformation temperature in the heating of NiTi substrate decreases after the films are deposited,whose extent is dependent on the film composition and their deposition process.The extent of decrease on the substrate with TiAlBN and TiAlCrFeSiBN films increases and the extent on the substrate with TiN films decreases as bias voltage increases.The films deposition makes martensite become larger.