XPS - an Analytical Tool for the Characterization of Surfaces and their Modifications by R. Kaufmann, H. Höcker and M. Möller
Summary
X-ray Photoelectron Spectroscopy is a surface sensitive technique to characterize solids with an information depth of about ten nanometers /1/. Beside the elemental composition the binding states of the elements are determined. The broad
field of application of this analytical
method leads to a routine use of XPS in the solution of surface
relevant questions. After an introduction into the basics of the technique and apparative prerequisites the powerful abilities of XPS are demonstrated in the field of polymer surface characterization.
X-ray Photoelectron Spectroscopy (XPS) – also known as Electron Spectroscopy for Chemical Analysis (ESCA) – is applied to many surface relevant processes like corrosion, catalysis, metallurgy, microelectronics, polymer technology etc. New
developments in
charge compensation devices which are necessary to measure insulators put discussions on charging and charge broadening into the background. Further developments of detectors allow XPS imaging as a useful extension of the method.
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