The process of hot filament chemical vapor
deposition (HFCVD) of diamond thin film on the chrome
interlayer electro-deposited on the cemented carbide is discussed. A hot filament temperature in the range of 2 400~2 500℃; a
substrate temperature in the range of 700~850℃; a CH_4concentration of 1%~2%; a H_2flow rate of 400 SCCM; and a chamber pressure in the range of 3～5 kPa are identified as the optimum deposition conditions for producing high quality diamond coatings. The diamond thin film with regular and uniformly distributed crystal is
obtained by the HFCVD equipment. The surface of the
CVD diamond thin film is studied by scanning electron microscope (SEM) and Raman scattering spectroscopy (Raman). Experimental results show that the process parameter has a great influence on the micro-structure and composition of the diamond thin film. A good quality diamond thin film with good micro-structure and little non-diamond composition can be obtained when the substrate temperature is heated about 800℃. High internal stress is also found in the diamond thin film.
More summaries about the Deposition of CVD Diamond Thin Film on Carbide Substrate by Using Cr Interlayer